The electrical and material properties of HfO xN y dielectric on germanium substrate
10.1143/JJAP.43.L1208
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sg-nus-scholar.10635-831702023-10-26T20:37:07Z The electrical and material properties of HfO xN y dielectric on germanium substrate Zhang, Q. Wu, N. Zhu, C. ELECTRICAL & COMPUTER ENGINEERING Annealing Deposition Germanium Hafnium oxynitride MOS capacitor 10.1143/JJAP.43.L1208 Japanese Journal of Applied Physics, Part 2: Letters 43 9 AB L1208-L1210 JAPLD 2014-10-07T04:38:07Z 2014-10-07T04:38:07Z 2004-09-15 Article Zhang, Q., Wu, N., Zhu, C. (2004-09-15). The electrical and material properties of HfO xN y dielectric on germanium substrate. Japanese Journal of Applied Physics, Part 2: Letters 43 (9 AB) : L1208-L1210. ScholarBank@NUS Repository. https://doi.org/10.1143/JJAP.43.L1208 00214922 http://scholarbank.nus.edu.sg/handle/10635/83170 000224441000027 Scopus |
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Annealing Deposition Germanium Hafnium oxynitride MOS capacitor |
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Annealing Deposition Germanium Hafnium oxynitride MOS capacitor Zhang, Q. Wu, N. Zhu, C. The electrical and material properties of HfO xN y dielectric on germanium substrate |
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10.1143/JJAP.43.L1208 |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Zhang, Q. Wu, N. Zhu, C. |
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Article |
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Zhang, Q. Wu, N. Zhu, C. |
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Zhang, Q. |
title |
The electrical and material properties of HfO xN y dielectric on germanium substrate |
title_short |
The electrical and material properties of HfO xN y dielectric on germanium substrate |
title_full |
The electrical and material properties of HfO xN y dielectric on germanium substrate |
title_fullStr |
The electrical and material properties of HfO xN y dielectric on germanium substrate |
title_full_unstemmed |
The electrical and material properties of HfO xN y dielectric on germanium substrate |
title_sort |
electrical and material properties of hfo xn y dielectric on germanium substrate |
publishDate |
2014 |
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http://scholarbank.nus.edu.sg/handle/10635/83170 |
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1781784319845466112 |