Thermal reaction of nickel and Si0.75Ge0.25 alloy

10.1116/1.1507339

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Bibliographic Details
Main Authors:	Pey, K.L., Choi, W.K., Chattopadhyay, S., Zhao, H.B., Fitzgerald, E.A., Antoniadis, D.A., Lee, P.S.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/83191
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Institution:	National University of Singapore

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