Thermal stability study of Si cap/ultrathin Ge/Si and strained Si/Si 1-xGex/Si nMOSFETs with HfO2 gate dielectric

Thermal stability study of Si cap/ultrathin Ge/Si and strained Si/Si 1-xGex/Si nMOSFETs with HfO2 gate dielectric

Semiconductor Science and Technology

Saved in:
Bibliographic Details
Main Authors: Yeo, C.C., Cho, B.J., Lee, M.H., Liu, C.W., Choi, K.J., Lee, T.W.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83194
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
id sg-nus-scholar.10635-83194
record_format dspace
spelling sg-nus-scholar.10635-831942023-10-31T09:16:27Z Thermal stability study of Si cap/ultrathin Ge/Si and strained Si/Si 1-xGex/Si nMOSFETs with HfO2 gate dielectric Yeo, C.C. Cho, B.J. Lee, M.H. Liu, C.W. Choi, K.J. Lee, T.W. ELECTRICAL & COMPUTER ENGINEERING Semiconductor Science and Technology 21 5 665-669 SSTEE 2014-10-07T04:38:24Z 2014-10-07T04:38:24Z 2006-05-01 Article Yeo, C.C., Cho, B.J., Lee, M.H., Liu, C.W., Choi, K.J., Lee, T.W. (2006-05-01). Thermal stability study of Si cap/ultrathin Ge/Si and strained Si/Si 1-xGex/Si nMOSFETs with HfO2 gate dielectric. Semiconductor Science and Technology 21 (5) : 665-669. ScholarBank@NUS Repository. 02681242 http://scholarbank.nus.edu.sg/handle/10635/83194 000237885000019 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description Semiconductor Science and Technology
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Yeo, C.C.
Cho, B.J.
Lee, M.H.
Liu, C.W.
Choi, K.J.
Lee, T.W.
format Article
author Yeo, C.C.
Cho, B.J.
Lee, M.H.
Liu, C.W.
Choi, K.J.
Lee, T.W.
spellingShingle Yeo, C.C.
Cho, B.J.
Lee, M.H.
Liu, C.W.
Choi, K.J.
Lee, T.W.
Thermal stability study of Si cap/ultrathin Ge/Si and strained Si/Si 1-xGex/Si nMOSFETs with HfO2 gate dielectric
author_sort Yeo, C.C.
title Thermal stability study of Si cap/ultrathin Ge/Si and strained Si/Si 1-xGex/Si nMOSFETs with HfO2 gate dielectric
title_short Thermal stability study of Si cap/ultrathin Ge/Si and strained Si/Si 1-xGex/Si nMOSFETs with HfO2 gate dielectric
title_full Thermal stability study of Si cap/ultrathin Ge/Si and strained Si/Si 1-xGex/Si nMOSFETs with HfO2 gate dielectric
title_fullStr Thermal stability study of Si cap/ultrathin Ge/Si and strained Si/Si 1-xGex/Si nMOSFETs with HfO2 gate dielectric
title_full_unstemmed Thermal stability study of Si cap/ultrathin Ge/Si and strained Si/Si 1-xGex/Si nMOSFETs with HfO2 gate dielectric
title_sort thermal stability study of si cap/ultrathin ge/si and strained si/si 1-xgex/si nmosfets with hfo2 gate dielectric
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/83194
_version_ 1781784324711907328

Similar Items