Three-layer laminated metal gate electrodes with tunable work functions for CMOS applications

10.1109/LED.2005.844701

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Bibliographic Details
Main Authors:	Bai, W.P., Bae, S.H., Wen, H.C., Mathew, S., Bera, L.K., Balasubramanian, N., Yamada, N., Li, M.F., Kwong, D.-L.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	CMOS Laminated metal gate Metal gate Metal nitride Work function
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/83206
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-83206
record_format	dspace
spelling	sg-nus-scholar.10635-832062023-10-30T07:11:58Z Three-layer laminated metal gate electrodes with tunable work functions for CMOS applications Bai, W.P. Bae, S.H. Wen, H.C. Mathew, S. Bera, L.K. Balasubramanian, N. Yamada, N. Li, M.F. Kwong, D.-L. ELECTRICAL & COMPUTER ENGINEERING CMOS Laminated metal gate Metal gate Metal nitride Work function 10.1109/LED.2005.844701 IEEE Electron Device Letters 26 4 231-233 EDLED 2014-10-07T04:38:32Z 2014-10-07T04:38:32Z 2005-04 Article Bai, W.P., Bae, S.H., Wen, H.C., Mathew, S., Bera, L.K., Balasubramanian, N., Yamada, N., Li, M.F., Kwong, D.-L. (2005-04). Three-layer laminated metal gate electrodes with tunable work functions for CMOS applications. IEEE Electron Device Letters 26 (4) : 231-233. ScholarBank@NUS Repository. https://doi.org/10.1109/LED.2005.844701 07413106 http://scholarbank.nus.edu.sg/handle/10635/83206 000227870600003 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	CMOS Laminated metal gate Metal gate Metal nitride Work function
spellingShingle	CMOS Laminated metal gate Metal gate Metal nitride Work function Bai, W.P. Bae, S.H. Wen, H.C. Mathew, S. Bera, L.K. Balasubramanian, N. Yamada, N. Li, M.F. Kwong, D.-L. Three-layer laminated metal gate electrodes with tunable work functions for CMOS applications
description	10.1109/LED.2005.844701
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Bai, W.P. Bae, S.H. Wen, H.C. Mathew, S. Bera, L.K. Balasubramanian, N. Yamada, N. Li, M.F. Kwong, D.-L.
format	Article
author	Bai, W.P. Bae, S.H. Wen, H.C. Mathew, S. Bera, L.K. Balasubramanian, N. Yamada, N. Li, M.F. Kwong, D.-L.
author_sort	Bai, W.P.
title	Three-layer laminated metal gate electrodes with tunable work functions for CMOS applications
title_short	Three-layer laminated metal gate electrodes with tunable work functions for CMOS applications
title_full	Three-layer laminated metal gate electrodes with tunable work functions for CMOS applications
title_fullStr	Three-layer laminated metal gate electrodes with tunable work functions for CMOS applications
title_full_unstemmed	Three-layer laminated metal gate electrodes with tunable work functions for CMOS applications
title_sort	three-layer laminated metal gate electrodes with tunable work functions for cmos applications
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/83206
_version_	1781784327729709056

Three-layer laminated metal gate electrodes with tunable work functions for CMOS applications

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