Three-layer laminated metal gate electrodes with tunable work functions for CMOS applications

Three-layer laminated metal gate electrodes with tunable work functions for CMOS applications

10.1109/LED.2005.844701

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Bibliographic Details
Main Authors: Bai, W.P., Bae, S.H., Wen, H.C., Mathew, S., Bera, L.K., Balasubramanian, N., Yamada, N., Li, M.F., Kwong, D.-L.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
CMOS
Laminated metal gate
Metal gate
Metal nitride
Work function
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83206
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Institution: National University of Singapore

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