Tunable stress and controlled thickness modification in graphene by annealing

10.1021/nn800031m

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Bibliographic Details
Main Authors: Ni, Z.H., Wang, H.M., Ma, Y., Kasim, J., Wu, Y.H., Shen, Z.X.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83223
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Institution: National University of Singapore
Description
Summary:10.1021/nn800031m