A comparative study of nickel silicide formation using a titanium cap layer and a titanium interlayer

Materials Research Society Symposium - Proceedings

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Bibliographic Details
Main Authors: Tan, W.L., Pey, K.L., Chooi, S.Y.M., Ye, J.H.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83341
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Institution: National University of Singapore