High-thermal-stability (HfO2)1-x(Al2O 3)x film fabricated by dual-beam laser ablation
10.1016/j.tsf.2005.09.037
Saved in:
| Main Authors: | , , , , , |
|---|---|
| Other Authors: | |
| Format: | Conference or Workshop Item |
| Published: |
2014
|
| Subjects: | |
| Online Access: | http://scholarbank.nus.edu.sg/handle/10635/83802 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Institution: | National University of Singapore |
| id |
sg-nus-scholar.10635-83802 |
|---|---|
| record_format |
dspace |
| spelling |
sg-nus-scholar.10635-838022024-11-14T10:20:39Z High-thermal-stability (HfO2)1-x(Al2O 3)x film fabricated by dual-beam laser ablation Li, Q. Wang, S.J. Ng, T.H. Chim, W.K. Huan, A.C.H. Ong, C.K. ELECTRICAL & COMPUTER ENGINEERING PHYSICS High-k dielectric thin films Interface Metal-insulator-semiconductor structures Pulse laser deposition 10.1016/j.tsf.2005.09.037 Thin Solid Films 504 1-2 45-49 THSFA 2014-10-07T04:45:21Z 2014-10-07T04:45:21Z 2006-05-10 Conference Paper Li, Q., Wang, S.J., Ng, T.H., Chim, W.K., Huan, A.C.H., Ong, C.K. (2006-05-10). High-thermal-stability (HfO2)1-x(Al2O 3)x film fabricated by dual-beam laser ablation. Thin Solid Films 504 (1-2) : 45-49. ScholarBank@NUS Repository. https://doi.org/10.1016/j.tsf.2005.09.037 00406090 http://scholarbank.nus.edu.sg/handle/10635/83802 000236486200012 Scopus |
| institution |
National University of Singapore |
| building |
NUS Library |
| continent |
Asia |
| country |
Singapore Singapore |
| content_provider |
NUS Library |
| collection |
ScholarBank@NUS |
| topic |
High-k dielectric thin films Interface Metal-insulator-semiconductor structures Pulse laser deposition |
| spellingShingle |
High-k dielectric thin films Interface Metal-insulator-semiconductor structures Pulse laser deposition Li, Q. Wang, S.J. Ng, T.H. Chim, W.K. Huan, A.C.H. Ong, C.K. High-thermal-stability (HfO2)1-x(Al2O 3)x film fabricated by dual-beam laser ablation |
| description |
10.1016/j.tsf.2005.09.037 |
| author2 |
ELECTRICAL & COMPUTER ENGINEERING |
| author_facet |
ELECTRICAL & COMPUTER ENGINEERING Li, Q. Wang, S.J. Ng, T.H. Chim, W.K. Huan, A.C.H. Ong, C.K. |
| format |
Conference or Workshop Item |
| author |
Li, Q. Wang, S.J. Ng, T.H. Chim, W.K. Huan, A.C.H. Ong, C.K. |
| author_sort |
Li, Q. |
| title |
High-thermal-stability (HfO2)1-x(Al2O 3)x film fabricated by dual-beam laser ablation |
| title_short |
High-thermal-stability (HfO2)1-x(Al2O 3)x film fabricated by dual-beam laser ablation |
| title_full |
High-thermal-stability (HfO2)1-x(Al2O 3)x film fabricated by dual-beam laser ablation |
| title_fullStr |
High-thermal-stability (HfO2)1-x(Al2O 3)x film fabricated by dual-beam laser ablation |
| title_full_unstemmed |
High-thermal-stability (HfO2)1-x(Al2O 3)x film fabricated by dual-beam laser ablation |
| title_sort |
high-thermal-stability (hfo2)1-x(al2o 3)x film fabricated by dual-beam laser ablation |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/83802 |
| _version_ |
1821194564521689088 |