High-thermal-stability (HfO2)1-x(Al2O 3)x film fabricated by dual-beam laser ablation
10.1016/j.tsf.2005.09.037
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Main Authors: | Li, Q., Wang, S.J., Ng, T.H., Chim, W.K., Huan, A.C.H., Ong, C.K. |
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Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
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Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/83802 |
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Institution: | National University of Singapore |
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