High-thermal-stability (HfO2)1-x(Al2O 3)x film fabricated by dual-beam laser ablation

• Main Authors: Li, Q., Wang, S.J., Ng, T.H., Chim, W.K., Huan, A.C.H., Ong, C.K.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Subjects: High-k dielectric thin films; Interface; Metal-insulator-semiconductor structures; Pulse laser deposition
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/83802
• Institution: National University of Singapore

10.1016/j.tsf.2005.09.037