High-thermal-stability (HfO2)1-x(Al2O 3)x film fabricated by dual-beam laser ablation

10.1016/j.tsf.2005.09.037

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Bibliographic Details
Main Authors:	Li, Q., Wang, S.J., Ng, T.H., Chim, W.K., Huan, A.C.H., Ong, C.K.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Subjects:	High-k dielectric thin films Interface Metal-insulator-semiconductor structures Pulse laser deposition
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/83802
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Institution:	National University of Singapore

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