Nanoscale arrays in lithium niobate fabricated by interference lithography and dry etching

• Main Authors: Si, G.Y., Danner, A.J., Teng, J.H., Ang, S.S., Chew, A.B., Dogheche, E.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Subjects: interference lithography; LiNbO3 dense arrays; plasma etching
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/83998
• Institution: National University of Singapore

10.1142/S0219581X10006867