Novel selenium implant and segregation for reduction of effective Schottky barrier height in NiGe/n-Ge contacts

10.1109/VLSI-TSA.2012.6210172

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Main Authors:	Tong, Y., Liu, B., Lim, P.S.Y., Zhou, Q., Yeo, Y.-C.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/84021
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-84021
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spelling	sg-nus-scholar.10635-840212015-01-08T10:55:52Z Novel selenium implant and segregation for reduction of effective Schottky barrier height in NiGe/n-Ge contacts Tong, Y. Liu, B. Lim, P.S.Y. Zhou, Q. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING 10.1109/VLSI-TSA.2012.6210172 International Symposium on VLSI Technology, Systems, and Applications, Proceedings - 2014-10-07T04:47:53Z 2014-10-07T04:47:53Z 2012 Conference Paper Tong, Y.,Liu, B.,Lim, P.S.Y.,Zhou, Q.,Yeo, Y.-C. (2012). Novel selenium implant and segregation for reduction of effective Schottky barrier height in NiGe/n-Ge contacts. International Symposium on VLSI Technology, Systems, and Applications, Proceedings : -. ScholarBank@NUS Repository. <a href="https://doi.org/10.1109/VLSI-TSA.2012.6210172" target="_blank">https://doi.org/10.1109/VLSI-TSA.2012.6210172</a> 9781457720840 19308868 http://scholarbank.nus.edu.sg/handle/10635/84021 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	10.1109/VLSI-TSA.2012.6210172
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Tong, Y. Liu, B. Lim, P.S.Y. Zhou, Q. Yeo, Y.-C.
format	Conference or Workshop Item
author	Tong, Y. Liu, B. Lim, P.S.Y. Zhou, Q. Yeo, Y.-C.
spellingShingle	Tong, Y. Liu, B. Lim, P.S.Y. Zhou, Q. Yeo, Y.-C. Novel selenium implant and segregation for reduction of effective Schottky barrier height in NiGe/n-Ge contacts
author_sort	Tong, Y.
title	Novel selenium implant and segregation for reduction of effective Schottky barrier height in NiGe/n-Ge contacts
title_short	Novel selenium implant and segregation for reduction of effective Schottky barrier height in NiGe/n-Ge contacts
title_full	Novel selenium implant and segregation for reduction of effective Schottky barrier height in NiGe/n-Ge contacts
title_fullStr	Novel selenium implant and segregation for reduction of effective Schottky barrier height in NiGe/n-Ge contacts
title_full_unstemmed	Novel selenium implant and segregation for reduction of effective Schottky barrier height in NiGe/n-Ge contacts
title_sort	novel selenium implant and segregation for reduction of effective schottky barrier height in nige/n-ge contacts
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/84021
_version_	1681089542658981888

Novel selenium implant and segregation for reduction of effective Schottky barrier height in NiGe/n-Ge contacts

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