Novel tellurium co-implantation and segregation for effective source/drain contact resistance reduction and gate work function modulation in n-FinFETs

Digest of Technical Papers - Symposium on VLSI Technology

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Main Authors: Koh, S.-M., Ding, Y., Guo, C., Leong, K.-C., Samudra, G.S., Yeo, Y.-C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/84025
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-840252015-01-06T20:51:05Z Novel tellurium co-implantation and segregation for effective source/drain contact resistance reduction and gate work function modulation in n-FinFETs Koh, S.-M. Ding, Y. Guo, C. Leong, K.-C. Samudra, G.S. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING Digest of Technical Papers - Symposium on VLSI Technology 86-87 DTPTE 2014-10-07T04:47:55Z 2014-10-07T04:47:55Z 2011 Conference Paper Koh, S.-M.,Ding, Y.,Guo, C.,Leong, K.-C.,Samudra, G.S.,Yeo, Y.-C. (2011). Novel tellurium co-implantation and segregation for effective source/drain contact resistance reduction and gate work function modulation in n-FinFETs. Digest of Technical Papers - Symposium on VLSI Technology : 86-87. ScholarBank@NUS Repository. 9784863481640 07431562 http://scholarbank.nus.edu.sg/handle/10635/84025 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description Digest of Technical Papers - Symposium on VLSI Technology
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Koh, S.-M.
Ding, Y.
Guo, C.
Leong, K.-C.
Samudra, G.S.
Yeo, Y.-C.
format Conference or Workshop Item
author Koh, S.-M.
Ding, Y.
Guo, C.
Leong, K.-C.
Samudra, G.S.
Yeo, Y.-C.
spellingShingle Koh, S.-M.
Ding, Y.
Guo, C.
Leong, K.-C.
Samudra, G.S.
Yeo, Y.-C.
Novel tellurium co-implantation and segregation for effective source/drain contact resistance reduction and gate work function modulation in n-FinFETs
author_sort Koh, S.-M.
title Novel tellurium co-implantation and segregation for effective source/drain contact resistance reduction and gate work function modulation in n-FinFETs
title_short Novel tellurium co-implantation and segregation for effective source/drain contact resistance reduction and gate work function modulation in n-FinFETs
title_full Novel tellurium co-implantation and segregation for effective source/drain contact resistance reduction and gate work function modulation in n-FinFETs
title_fullStr Novel tellurium co-implantation and segregation for effective source/drain contact resistance reduction and gate work function modulation in n-FinFETs
title_full_unstemmed Novel tellurium co-implantation and segregation for effective source/drain contact resistance reduction and gate work function modulation in n-FinFETs
title_sort novel tellurium co-implantation and segregation for effective source/drain contact resistance reduction and gate work function modulation in n-finfets
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/84025
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