Novel ZrO2/Si3N4 dual charge storage layer to form step-up potential wells for highly reliable multi-level cell application

10.1109/IEDM.2007.4418869

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Bibliographic Details
Main Authors: Zhang, G., Wan, S.H., Bobade, S.M., Lee, S.-H., Cho, B.-J., Won, J.Y.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/84026
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-840262024-11-14T01:23:49Z Novel ZrO2/Si3N4 dual charge storage layer to form step-up potential wells for highly reliable multi-level cell application Zhang, G. Wan, S.H. Bobade, S.M. Lee, S.-H. Cho, B.-J. Won, J.Y. ELECTRICAL & COMPUTER ENGINEERING 10.1109/IEDM.2007.4418869 Technical Digest - International Electron Devices Meeting, IEDM 83-86 TDIMD 2014-10-07T04:47:56Z 2014-10-07T04:47:56Z 2007 Conference Paper Zhang, G., Wan, S.H., Bobade, S.M., Lee, S.-H., Cho, B.-J., Won, J.Y. (2007). Novel ZrO2/Si3N4 dual charge storage layer to form step-up potential wells for highly reliable multi-level cell application. Technical Digest - International Electron Devices Meeting, IEDM : 83-86. ScholarBank@NUS Repository. https://doi.org/10.1109/IEDM.2007.4418869 01631918 http://scholarbank.nus.edu.sg/handle/10635/84026 000259347800017 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1109/IEDM.2007.4418869
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Zhang, G.
Wan, S.H.
Bobade, S.M.
Lee, S.-H.
Cho, B.-J.
Won, J.Y.
format Conference or Workshop Item
author Zhang, G.
Wan, S.H.
Bobade, S.M.
Lee, S.-H.
Cho, B.-J.
Won, J.Y.
spellingShingle Zhang, G.
Wan, S.H.
Bobade, S.M.
Lee, S.-H.
Cho, B.-J.
Won, J.Y.
Novel ZrO2/Si3N4 dual charge storage layer to form step-up potential wells for highly reliable multi-level cell application
author_sort Zhang, G.
title Novel ZrO2/Si3N4 dual charge storage layer to form step-up potential wells for highly reliable multi-level cell application
title_short Novel ZrO2/Si3N4 dual charge storage layer to form step-up potential wells for highly reliable multi-level cell application
title_full Novel ZrO2/Si3N4 dual charge storage layer to form step-up potential wells for highly reliable multi-level cell application
title_fullStr Novel ZrO2/Si3N4 dual charge storage layer to form step-up potential wells for highly reliable multi-level cell application
title_full_unstemmed Novel ZrO2/Si3N4 dual charge storage layer to form step-up potential wells for highly reliable multi-level cell application
title_sort novel zro2/si3n4 dual charge storage layer to form step-up potential wells for highly reliable multi-level cell application
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/84026
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