Silicon-carbon source/drain: Selective epitaxy, process integration, and transistor strain engineering
10.1149/1.2355908
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sg-nus-scholar.10635-841812016-01-02T03:03:35Z Silicon-carbon source/drain: Selective epitaxy, process integration, and transistor strain engineering Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING 10.1149/1.2355908 ECS Transactions 3 7 1143-1150 2014-10-07T04:49:44Z 2014-10-07T04:49:44Z 2006 Conference Paper Yeo, Y.-C. (2006). Silicon-carbon source/drain: Selective epitaxy, process integration, and transistor strain engineering. ECS Transactions 3 (7) : 1143-1150. ScholarBank@NUS Repository. <a href="https://doi.org/10.1149/1.2355908" target="_blank">https://doi.org/10.1149/1.2355908</a> 19385862 http://scholarbank.nus.edu.sg/handle/10635/84181 NOT_IN_WOS Scopus |
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10.1149/1.2355908 |
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ELECTRICAL & COMPUTER ENGINEERING |
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ELECTRICAL & COMPUTER ENGINEERING Yeo, Y.-C. |
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Conference or Workshop Item |
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Yeo, Y.-C. |
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Yeo, Y.-C. Silicon-carbon source/drain: Selective epitaxy, process integration, and transistor strain engineering |
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Yeo, Y.-C. |
title |
Silicon-carbon source/drain: Selective epitaxy, process integration, and transistor strain engineering |
title_short |
Silicon-carbon source/drain: Selective epitaxy, process integration, and transistor strain engineering |
title_full |
Silicon-carbon source/drain: Selective epitaxy, process integration, and transistor strain engineering |
title_fullStr |
Silicon-carbon source/drain: Selective epitaxy, process integration, and transistor strain engineering |
title_full_unstemmed |
Silicon-carbon source/drain: Selective epitaxy, process integration, and transistor strain engineering |
title_sort |
silicon-carbon source/drain: selective epitaxy, process integration, and transistor strain engineering |
publishDate |
2014 |
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http://scholarbank.nus.edu.sg/handle/10635/84181 |
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