Silicon-carbon source/drain: Selective epitaxy, process integration, and transistor strain engineering

10.1149/1.2355908

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Bibliographic Details
Main Author: Yeo, Y.-C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/84181
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-841812016-01-02T03:03:35Z Silicon-carbon source/drain: Selective epitaxy, process integration, and transistor strain engineering Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING 10.1149/1.2355908 ECS Transactions 3 7 1143-1150 2014-10-07T04:49:44Z 2014-10-07T04:49:44Z 2006 Conference Paper Yeo, Y.-C. (2006). Silicon-carbon source/drain: Selective epitaxy, process integration, and transistor strain engineering. ECS Transactions 3 (7) : 1143-1150. ScholarBank@NUS Repository. <a href="https://doi.org/10.1149/1.2355908" target="_blank">https://doi.org/10.1149/1.2355908</a> 19385862 http://scholarbank.nus.edu.sg/handle/10635/84181 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description 10.1149/1.2355908
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Yeo, Y.-C.
format Conference or Workshop Item
author Yeo, Y.-C.
spellingShingle Yeo, Y.-C.
Silicon-carbon source/drain: Selective epitaxy, process integration, and transistor strain engineering
author_sort Yeo, Y.-C.
title Silicon-carbon source/drain: Selective epitaxy, process integration, and transistor strain engineering
title_short Silicon-carbon source/drain: Selective epitaxy, process integration, and transistor strain engineering
title_full Silicon-carbon source/drain: Selective epitaxy, process integration, and transistor strain engineering
title_fullStr Silicon-carbon source/drain: Selective epitaxy, process integration, and transistor strain engineering
title_full_unstemmed Silicon-carbon source/drain: Selective epitaxy, process integration, and transistor strain engineering
title_sort silicon-carbon source/drain: selective epitaxy, process integration, and transistor strain engineering
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/84181
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