Single silicide comprising nickel-dysprosium alloy for integration in p- and n-FinFETs with independent control of contact resistance by aluminum implant
Digest of Technical Papers - Symposium on VLSI Technology
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sg-nus-scholar.10635-841972015-01-07T06:32:52Z Single silicide comprising nickel-dysprosium alloy for integration in p- and n-FinFETs with independent control of contact resistance by aluminum implant Sinha, M. Lee, R.T.P. Devi, S.N. Lo, G.-Q. Eng, F.C. Yeo, Y.-C. ELECTRICAL & COMPUTER ENGINEERING Digest of Technical Papers - Symposium on VLSI Technology 106-107 DTPTE 2014-10-07T04:49:55Z 2014-10-07T04:49:55Z 2009 Conference Paper Sinha, M.,Lee, R.T.P.,Devi, S.N.,Lo, G.-Q.,Eng, F.C.,Yeo, Y.-C. (2009). Single silicide comprising nickel-dysprosium alloy for integration in p- and n-FinFETs with independent control of contact resistance by aluminum implant. Digest of Technical Papers - Symposium on VLSI Technology : 106-107. ScholarBank@NUS Repository. 9784863480094 07431562 http://scholarbank.nus.edu.sg/handle/10635/84197 NOT_IN_WOS Scopus |
| institution |
National University of Singapore |
| building |
NUS Library |
| country |
Singapore |
| collection |
ScholarBank@NUS |
| description |
Digest of Technical Papers - Symposium on VLSI Technology |
| author2 |
ELECTRICAL & COMPUTER ENGINEERING |
| author_facet |
ELECTRICAL & COMPUTER ENGINEERING Sinha, M. Lee, R.T.P. Devi, S.N. Lo, G.-Q. Eng, F.C. Yeo, Y.-C. |
| format |
Conference or Workshop Item |
| author |
Sinha, M. Lee, R.T.P. Devi, S.N. Lo, G.-Q. Eng, F.C. Yeo, Y.-C. |
| spellingShingle |
Sinha, M. Lee, R.T.P. Devi, S.N. Lo, G.-Q. Eng, F.C. Yeo, Y.-C. Single silicide comprising nickel-dysprosium alloy for integration in p- and n-FinFETs with independent control of contact resistance by aluminum implant |
| author_sort |
Sinha, M. |
| title |
Single silicide comprising nickel-dysprosium alloy for integration in p- and n-FinFETs with independent control of contact resistance by aluminum implant |
| title_short |
Single silicide comprising nickel-dysprosium alloy for integration in p- and n-FinFETs with independent control of contact resistance by aluminum implant |
| title_full |
Single silicide comprising nickel-dysprosium alloy for integration in p- and n-FinFETs with independent control of contact resistance by aluminum implant |
| title_fullStr |
Single silicide comprising nickel-dysprosium alloy for integration in p- and n-FinFETs with independent control of contact resistance by aluminum implant |
| title_full_unstemmed |
Single silicide comprising nickel-dysprosium alloy for integration in p- and n-FinFETs with independent control of contact resistance by aluminum implant |
| title_sort |
single silicide comprising nickel-dysprosium alloy for integration in p- and n-finfets with independent control of contact resistance by aluminum implant |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/84197 |
| _version_ |
1681089574480117760 |