Dipole options for 90nm lithography technologies and below
10.1117/12.485432
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sg-nus-scholar.10635-859272024-11-13T04:24:15Z Dipole options for 90nm lithography technologies and below Chua, G.S. Tay, C.J. Quan, C. Lin, Q. Chua, L.H. MECHANICAL ENGINEERING 193nm lithography 90nm equal lines and spaces Diffraction orders Dipole illumination RETs 10.1117/12.485432 Proceedings of SPIE - The International Society for Optical Engineering 5040 III 1284-1295 PSISD 2014-10-07T09:13:49Z 2014-10-07T09:13:49Z 2003 Conference Paper Chua, G.S., Tay, C.J., Quan, C., Lin, Q., Chua, L.H. (2003). Dipole options for 90nm lithography technologies and below. Proceedings of SPIE - The International Society for Optical Engineering 5040 III : 1284-1295. ScholarBank@NUS Repository. https://doi.org/10.1117/12.485432 0277786X http://scholarbank.nus.edu.sg/handle/10635/85927 000184322600127 Scopus |
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193nm lithography 90nm equal lines and spaces Diffraction orders Dipole illumination RETs |
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193nm lithography 90nm equal lines and spaces Diffraction orders Dipole illumination RETs Chua, G.S. Tay, C.J. Quan, C. Lin, Q. Chua, L.H. Dipole options for 90nm lithography technologies and below |
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10.1117/12.485432 |
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MECHANICAL ENGINEERING |
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MECHANICAL ENGINEERING Chua, G.S. Tay, C.J. Quan, C. Lin, Q. Chua, L.H. |
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Conference or Workshop Item |
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Chua, G.S. Tay, C.J. Quan, C. Lin, Q. Chua, L.H. |
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Chua, G.S. |
title |
Dipole options for 90nm lithography technologies and below |
title_short |
Dipole options for 90nm lithography technologies and below |
title_full |
Dipole options for 90nm lithography technologies and below |
title_fullStr |
Dipole options for 90nm lithography technologies and below |
title_full_unstemmed |
Dipole options for 90nm lithography technologies and below |
title_sort |
dipole options for 90nm lithography technologies and below |
publishDate |
2014 |
url |
http://scholarbank.nus.edu.sg/handle/10635/85927 |
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