Mechanism and dissolution rates of anodic oxide films on silicon

Mechanism and dissolution rates of anodic oxide films on silicon

10.1016/j.electacta.2013.04.024

Saved in:
Bibliographic Details
Main Authors: Liu, D.Q., Blackwood, D.J.
Other Authors: MATERIALS SCIENCE AND ENGINEERING
Format: Article
Published: 2014
Subjects:
Electropolishing
Potentiodynamic polarization
Salt film
Silicon
Online Access:http://scholarbank.nus.edu.sg/handle/10635/86531
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/86531

Similar Items