Mechanism and dissolution rates of anodic oxide films on silicon
10.1016/j.electacta.2013.04.024
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Main Authors: | Liu, D.Q., Blackwood, D.J. |
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Other Authors: | MATERIALS SCIENCE AND ENGINEERING |
Format: | Article |
Published: |
2014
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Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/86531 |
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Institution: | National University of Singapore |
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