Mechanism and dissolution rates of anodic oxide films on silicon

Mechanism and dissolution rates of anodic oxide films on silicon

10.1016/j.electacta.2013.04.024

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Bibliographic Details
Main Authors: Liu, D.Q., Blackwood, D.J.
Other Authors: MATERIALS SCIENCE AND ENGINEERING
Format: Article
Published: 2014
Subjects:
Electropolishing
Potentiodynamic polarization
Salt film
Silicon
Online Access:http://scholarbank.nus.edu.sg/handle/10635/86531
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Institution: National University of Singapore
Description
Summary:10.1016/j.electacta.2013.04.024

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