Submicrometer lithography of a silicon substrate by machining of photoresist using atomic force microscopy followed by wet chemical etching

10.1088/0957-4484/8/2/005

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Bibliographic Details
Main Authors:	Li, S.F.Y., Ng, H.T., Zhang, P.C., Ho, P.K.H., Zhou, L., Bao, G.W., Chan, S.L.H.
Other Authors:	MATERIALS SCIENCE
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/94936
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-94936
record_format	dspace
spelling	sg-nus-scholar.10635-949362023-10-30T10:08:52Z Submicrometer lithography of a silicon substrate by machining of photoresist using atomic force microscopy followed by wet chemical etching Li, S.F.Y. Ng, H.T. Zhang, P.C. Ho, P.K.H. Zhou, L. Bao, G.W. Chan, S.L.H. MATERIALS SCIENCE CHEMISTRY 10.1088/0957-4484/8/2/005 Nanotechnology 8 2 76-81 NNOTE 2014-10-16T08:41:54Z 2014-10-16T08:41:54Z 1997-06 Article Li, S.F.Y., Ng, H.T., Zhang, P.C., Ho, P.K.H., Zhou, L., Bao, G.W., Chan, S.L.H. (1997-06). Submicrometer lithography of a silicon substrate by machining of photoresist using atomic force microscopy followed by wet chemical etching. Nanotechnology 8 (2) : 76-81. ScholarBank@NUS Repository. https://doi.org/10.1088/0957-4484/8/2/005 09574484 http://scholarbank.nus.edu.sg/handle/10635/94936 A1997XE24100005 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	10.1088/0957-4484/8/2/005
author2	MATERIALS SCIENCE
author_facet	MATERIALS SCIENCE Li, S.F.Y. Ng, H.T. Zhang, P.C. Ho, P.K.H. Zhou, L. Bao, G.W. Chan, S.L.H.
format	Article
author	Li, S.F.Y. Ng, H.T. Zhang, P.C. Ho, P.K.H. Zhou, L. Bao, G.W. Chan, S.L.H.
spellingShingle	Li, S.F.Y. Ng, H.T. Zhang, P.C. Ho, P.K.H. Zhou, L. Bao, G.W. Chan, S.L.H. Submicrometer lithography of a silicon substrate by machining of photoresist using atomic force microscopy followed by wet chemical etching
author_sort	Li, S.F.Y.
title	Submicrometer lithography of a silicon substrate by machining of photoresist using atomic force microscopy followed by wet chemical etching
title_short	Submicrometer lithography of a silicon substrate by machining of photoresist using atomic force microscopy followed by wet chemical etching
title_full	Submicrometer lithography of a silicon substrate by machining of photoresist using atomic force microscopy followed by wet chemical etching
title_fullStr	Submicrometer lithography of a silicon substrate by machining of photoresist using atomic force microscopy followed by wet chemical etching
title_full_unstemmed	Submicrometer lithography of a silicon substrate by machining of photoresist using atomic force microscopy followed by wet chemical etching
title_sort	submicrometer lithography of a silicon substrate by machining of photoresist using atomic force microscopy followed by wet chemical etching
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/94936
_version_	1781786190475689984

Submicrometer lithography of a silicon substrate by machining of photoresist using atomic force microscopy followed by wet chemical etching

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