Submicrometer lithography of a silicon substrate by machining of photoresist using atomic force microscopy followed by wet chemical etching

Submicrometer lithography of a silicon substrate by machining of photoresist using atomic force microscopy followed by wet chemical etching

10.1088/0957-4484/8/2/005

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Bibliographic Details
Main Authors: Li, S.F.Y., Ng, H.T., Zhang, P.C., Ho, P.K.H., Zhou, L., Bao, G.W., Chan, S.L.H.
Other Authors: MATERIALS SCIENCE
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/94936
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Institution: National University of Singapore
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