Control of semiconductor substrate temperature uniformity during photoresist processing in lithography

Proceedings of 2009 7th Asian Control Conference, ASCC 2009

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Bibliographic Details
Main Authors: Tay, A., Chua, H.-T., Wang, Y., Yang, G.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/69733
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Institution: National University of Singapore