Control of semiconductor substrate temperature uniformity during photoresist processing in lithography
Proceedings of 2009 7th Asian Control Conference, ASCC 2009
Saved in:
Main Authors: | Tay, A., Chua, H.-T., Wang, Y., Yang, G. |
---|---|
Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
|
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/69733 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
Integrated bake/chill system for across-wafer temperature uniformity control in photoresist processing
by: Chua, H.T., et al.
Published: (2014) -
In-situ monitoring and control of photoresist parameters during thermal processing in the lithography sequence
by: Wu, X., et al.
Published: (2014) -
Control of Photoresist Thickness Uniformity in the Microlithography Process
by: Tay, A.
Published: (2014) -
In situ monitoring of photoresist thickness uniformity of a rotating wafer in lithography
by: Tay, A., et al.
Published: (2014) -
In-situ measurement and control of photoresist processing in lithography
by: HU NI
Published: (2010)