Control of semiconductor substrate temperature uniformity during photoresist processing in lithography

Control of semiconductor substrate temperature uniformity during photoresist processing in lithography

Proceedings of 2009 7th Asian Control Conference, ASCC 2009

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Bibliographic Details
Main Authors: Tay, A., Chua, H.-T., Wang, Y., Yang, G.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/69733
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Institution: National University of Singapore
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Summary:Proceedings of 2009 7th Asian Control Conference, ASCC 2009

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