Control of semiconductor substrate temperature uniformity during photoresist processing in lithography
Proceedings of 2009 7th Asian Control Conference, ASCC 2009
Saved in:
| Main Authors: | , , , |
|---|---|
| Other Authors: | |
| Format: | Conference or Workshop Item |
| Published: |
2014
|
| Online Access: | http://scholarbank.nus.edu.sg/handle/10635/69733 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Institution: | National University of Singapore |
| id |
sg-nus-scholar.10635-69733 |
|---|---|
| record_format |
dspace |
| spelling |
sg-nus-scholar.10635-697332015-01-16T15:02:00Z Control of semiconductor substrate temperature uniformity during photoresist processing in lithography Tay, A. Chua, H.-T. Wang, Y. Yang, G. ELECTRICAL & COMPUTER ENGINEERING Proceedings of 2009 7th Asian Control Conference, ASCC 2009 853-858 2014-06-19T03:04:02Z 2014-06-19T03:04:02Z 2009 Conference Paper Tay, A.,Chua, H.-T.,Wang, Y.,Yang, G. (2009). Control of semiconductor substrate temperature uniformity during photoresist processing in lithography. Proceedings of 2009 7th Asian Control Conference, ASCC 2009 : 853-858. ScholarBank@NUS Repository. 9788995605691 http://scholarbank.nus.edu.sg/handle/10635/69733 NOT_IN_WOS Scopus |
| institution |
National University of Singapore |
| building |
NUS Library |
| country |
Singapore |
| collection |
ScholarBank@NUS |
| description |
Proceedings of 2009 7th Asian Control Conference, ASCC 2009 |
| author2 |
ELECTRICAL & COMPUTER ENGINEERING |
| author_facet |
ELECTRICAL & COMPUTER ENGINEERING Tay, A. Chua, H.-T. Wang, Y. Yang, G. |
| format |
Conference or Workshop Item |
| author |
Tay, A. Chua, H.-T. Wang, Y. Yang, G. |
| spellingShingle |
Tay, A. Chua, H.-T. Wang, Y. Yang, G. Control of semiconductor substrate temperature uniformity during photoresist processing in lithography |
| author_sort |
Tay, A. |
| title |
Control of semiconductor substrate temperature uniformity during photoresist processing in lithography |
| title_short |
Control of semiconductor substrate temperature uniformity during photoresist processing in lithography |
| title_full |
Control of semiconductor substrate temperature uniformity during photoresist processing in lithography |
| title_fullStr |
Control of semiconductor substrate temperature uniformity during photoresist processing in lithography |
| title_full_unstemmed |
Control of semiconductor substrate temperature uniformity during photoresist processing in lithography |
| title_sort |
control of semiconductor substrate temperature uniformity during photoresist processing in lithography |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/69733 |
| _version_ |
1681087067786838016 |