Substrate influence on the formation of FeSi and FeSi2 films from cis-Fe(SiCl3)2(CO)4 by LPCVD

Substrate influence on the formation of FeSi and FeSi2 films from cis-Fe(SiCl3)2(CO)4 by LPCVD

Thin Solid Films

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書目詳細資料
Main Authors:	Luo, L., Zybill, C.E., Ang, H.G., Lim, S.F., Chua, D.H.C., Lin, J., Wee, A.T.S., Tan, K.L.
其他作者:	PHYSICS
格式:	Article
出版:	2014
主題:	FeSi films Film composition Film formation Low-pressure chemical vapor deposition
在線閱讀:	http://scholarbank.nus.edu.sg/handle/10635/94964
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!
機構:	National University of Singapore

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