XAFS studies of Al/TiNx films on Si(100) at the Al K- and L3,2-edge

XAFS studies of Al/TiNx films on Si(100) at the Al K- and L3,2-edge

Journal of Synchrotron Radiation

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Bibliographic Details
Main Authors: Zou, Z., Hu, Y.F., Sham, T.K., Huang, H.H., Xu, G.Q., Seet, C.S., Chan, L.
Other Authors: CHEMISTRY
Format: Article
Published: 2014
Subjects:
Al K-edge
Al L3,2-edge
Diffusion barrier
High temperature processing
XANES
Online Access:http://scholarbank.nus.edu.sg/handle/10635/95416
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/95416

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