XAFS studies of Al/TiNx films on Si(100) at the Al K- and L3,2-edge

Journal of Synchrotron Radiation

Saved in:
Bibliographic Details
Main Authors: Zou, Z., Hu, Y.F., Sham, T.K., Huang, H.H., Xu, G.Q., Seet, C.S., Chan, L.
Other Authors: CHEMISTRY
Format: Article
Published: 2014
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/95416
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
id sg-nus-scholar.10635-95416
record_format dspace
spelling sg-nus-scholar.10635-954162015-01-16T16:56:12Z XAFS studies of Al/TiNx films on Si(100) at the Al K- and L3,2-edge Zou, Z. Hu, Y.F. Sham, T.K. Huang, H.H. Xu, G.Q. Seet, C.S. Chan, L. CHEMISTRY Al K-edge Al L3,2-edge Diffusion barrier High temperature processing XANES Journal of Synchrotron Radiation 6 3 524-525 2014-10-16T08:47:36Z 2014-10-16T08:47:36Z 1999-05-01 Article Zou, Z.,Hu, Y.F.,Sham, T.K.,Huang, H.H.,Xu, G.Q.,Seet, C.S.,Chan, L. (1999-05-01). XAFS studies of Al/TiNx films on Si(100) at the Al K- and L3,2-edge. Journal of Synchrotron Radiation 6 (3) : 524-525. ScholarBank@NUS Repository. 09090495 http://scholarbank.nus.edu.sg/handle/10635/95416 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
topic Al K-edge
Al L3,2-edge
Diffusion barrier
High temperature processing
XANES
spellingShingle Al K-edge
Al L3,2-edge
Diffusion barrier
High temperature processing
XANES
Zou, Z.
Hu, Y.F.
Sham, T.K.
Huang, H.H.
Xu, G.Q.
Seet, C.S.
Chan, L.
XAFS studies of Al/TiNx films on Si(100) at the Al K- and L3,2-edge
description Journal of Synchrotron Radiation
author2 CHEMISTRY
author_facet CHEMISTRY
Zou, Z.
Hu, Y.F.
Sham, T.K.
Huang, H.H.
Xu, G.Q.
Seet, C.S.
Chan, L.
format Article
author Zou, Z.
Hu, Y.F.
Sham, T.K.
Huang, H.H.
Xu, G.Q.
Seet, C.S.
Chan, L.
author_sort Zou, Z.
title XAFS studies of Al/TiNx films on Si(100) at the Al K- and L3,2-edge
title_short XAFS studies of Al/TiNx films on Si(100) at the Al K- and L3,2-edge
title_full XAFS studies of Al/TiNx films on Si(100) at the Al K- and L3,2-edge
title_fullStr XAFS studies of Al/TiNx films on Si(100) at the Al K- and L3,2-edge
title_full_unstemmed XAFS studies of Al/TiNx films on Si(100) at the Al K- and L3,2-edge
title_sort xafs studies of al/tinx films on si(100) at the al k- and l3,2-edge
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/95416
_version_ 1681091474752536576