XAFS studies of Al/TiNx films on Si(100) at the Al K- and L3,2-edge
Journal of Synchrotron Radiation
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sg-nus-scholar.10635-954162015-01-16T16:56:12Z XAFS studies of Al/TiNx films on Si(100) at the Al K- and L3,2-edge Zou, Z. Hu, Y.F. Sham, T.K. Huang, H.H. Xu, G.Q. Seet, C.S. Chan, L. CHEMISTRY Al K-edge Al L3,2-edge Diffusion barrier High temperature processing XANES Journal of Synchrotron Radiation 6 3 524-525 2014-10-16T08:47:36Z 2014-10-16T08:47:36Z 1999-05-01 Article Zou, Z.,Hu, Y.F.,Sham, T.K.,Huang, H.H.,Xu, G.Q.,Seet, C.S.,Chan, L. (1999-05-01). XAFS studies of Al/TiNx films on Si(100) at the Al K- and L3,2-edge. Journal of Synchrotron Radiation 6 (3) : 524-525. ScholarBank@NUS Repository. 09090495 http://scholarbank.nus.edu.sg/handle/10635/95416 NOT_IN_WOS Scopus |
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Al K-edge Al L3,2-edge Diffusion barrier High temperature processing XANES |
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Al K-edge Al L3,2-edge Diffusion barrier High temperature processing XANES Zou, Z. Hu, Y.F. Sham, T.K. Huang, H.H. Xu, G.Q. Seet, C.S. Chan, L. XAFS studies of Al/TiNx films on Si(100) at the Al K- and L3,2-edge |
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Journal of Synchrotron Radiation |
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CHEMISTRY |
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CHEMISTRY Zou, Z. Hu, Y.F. Sham, T.K. Huang, H.H. Xu, G.Q. Seet, C.S. Chan, L. |
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Article |
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Zou, Z. Hu, Y.F. Sham, T.K. Huang, H.H. Xu, G.Q. Seet, C.S. Chan, L. |
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Zou, Z. |
title |
XAFS studies of Al/TiNx films on Si(100) at the Al K- and L3,2-edge |
title_short |
XAFS studies of Al/TiNx films on Si(100) at the Al K- and L3,2-edge |
title_full |
XAFS studies of Al/TiNx films on Si(100) at the Al K- and L3,2-edge |
title_fullStr |
XAFS studies of Al/TiNx films on Si(100) at the Al K- and L3,2-edge |
title_full_unstemmed |
XAFS studies of Al/TiNx films on Si(100) at the Al K- and L3,2-edge |
title_sort |
xafs studies of al/tinx films on si(100) at the al k- and l3,2-edge |
publishDate |
2014 |
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http://scholarbank.nus.edu.sg/handle/10635/95416 |
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1681091474752536576 |