Post-annealing effect in reactive r.f.-magnetron-sputtered carbon nitride thin films

10.1002/(SICI)1096-9918(199908)28:1<245::AID-SIA586>3.0.CO;2-I

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Bibliographic Details
Main Authors:	Chen, G.L., Li, Y., Lin, J., Huan, C.H.A., Guo, Y.P.
Other Authors:	MATERIALS SCIENCE
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/97574
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Institution:	National University of Singapore

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Summary:	10.1002/(SICI)1096-9918(199908)28:1<245::AID-SIA586>3.0.CO;2-I

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