Quantitative analysis of a-Si1 - XCx:H thin films

Quantitative analysis of a-Si1 - XCx:H thin films

Applied Surface Science

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Bibliographic Details
Main Authors: Gracin, D., Jakšić, M., Yang, C., Borjanović, V., Praček, B.
Other Authors: PHYSICS
Format: Article
Published: 2014
Subjects:
Amorphous films
Auger spectroscopy
Backscattering
Carbon content
FTIR spectroscopy
Hydrogen content
Online Access:http://scholarbank.nus.edu.sg/handle/10635/97660
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Institution: National University of Singapore
Description
Summary:Applied Surface Science

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