Solid phase epitaxy of ultra-shallow Sn implanted Si observed using high-resolution Rutherford backscattering spectrometry

10.1063/1.4747487

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Bibliographic Details
Main Authors: Chan, T.K., Fang, F., Markwitz, A., Osipowicz, T.
Other Authors: PHYSICS
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/97961
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Institution: National University of Singapore