Enhanced boron activation in strained-Si/Si1-xGex substrate using laser annealing

10.1149/1.2209374

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Bibliographic Details
Main Authors:	Ong, K.K., Pey, K.L., Lee, P.S., Wee, A.T.S., Wang, X.C., Wong, L.H.
Other Authors:	PHYSICS
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/98698
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Institution:	National University of Singapore

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Summary:	10.1149/1.2209374

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