Enhanced boron activation in strained-Si/Si1-xGex substrate using laser annealing
10.1149/1.2209374
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sg-nus-scholar.10635-986982015-02-22T20:22:19Z Enhanced boron activation in strained-Si/Si1-xGex substrate using laser annealing Ong, K.K. Pey, K.L. Lee, P.S. Wee, A.T.S. Wang, X.C. Wong, L.H. PHYSICS 10.1149/1.2209374 ECS Transactions 1 30 1-6 2014-10-16T09:50:20Z 2014-10-16T09:50:20Z 2006 Conference Paper Ong, K.K.,Pey, K.L.,Lee, P.S.,Wee, A.T.S.,Wang, X.C.,Wong, L.H. (2006). Enhanced boron activation in strained-Si/Si1-xGex substrate using laser annealing. ECS Transactions 1 (30) : 1-6. ScholarBank@NUS Repository. <a href="https://doi.org/10.1149/1.2209374" target="_blank">https://doi.org/10.1149/1.2209374</a> 19385862 http://scholarbank.nus.edu.sg/handle/10635/98698 NOT_IN_WOS Scopus |
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PHYSICS Ong, K.K. Pey, K.L. Lee, P.S. Wee, A.T.S. Wang, X.C. Wong, L.H. |
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Conference or Workshop Item |
author |
Ong, K.K. Pey, K.L. Lee, P.S. Wee, A.T.S. Wang, X.C. Wong, L.H. |
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Ong, K.K. Pey, K.L. Lee, P.S. Wee, A.T.S. Wang, X.C. Wong, L.H. Enhanced boron activation in strained-Si/Si1-xGex substrate using laser annealing |
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Ong, K.K. |
title |
Enhanced boron activation in strained-Si/Si1-xGex substrate using laser annealing |
title_short |
Enhanced boron activation in strained-Si/Si1-xGex substrate using laser annealing |
title_full |
Enhanced boron activation in strained-Si/Si1-xGex substrate using laser annealing |
title_fullStr |
Enhanced boron activation in strained-Si/Si1-xGex substrate using laser annealing |
title_full_unstemmed |
Enhanced boron activation in strained-Si/Si1-xGex substrate using laser annealing |
title_sort |
enhanced boron activation in strained-si/si1-xgex substrate using laser annealing |
publishDate |
2014 |
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http://scholarbank.nus.edu.sg/handle/10635/98698 |
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1681092071300005888 |