Enhanced boron activation in strained-Si/Si1-xGex substrate using laser annealing
10.1149/1.2209374
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Main Authors: | Ong, K.K., Pey, K.L., Lee, P.S., Wee, A.T.S., Wang, X.C., Wong, L.H. |
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Other Authors: | PHYSICS |
Format: | Conference or Workshop Item |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/98698 |
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Institution: | National University of Singapore |
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