Fabrication of electrostatic MEMS microactuator based on X-ray lithography with Pb-based X-ray mask and dry-film-transfer-to-PCB process

Lithographie Galvanoformung Abformung (LIGA) is a promising approach for fabrication of high aspect ratio 3D microactuator for dual-stage slider in hard disk drive. However, this approach involves practically challenging X-ray lithography and structural transfer processes. In this work, electrostati...

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Main Authors: Kerdlapee,P., Wisitsoraat,A., Phokaratkul,D., Leksakul,K., Phatthanakun,R., Tuantranont,A.
Format: Article
Published: Springer Verlag 2015
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http://cmuir.cmu.ac.th/handle/6653943832/39027
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Institution: Chiang Mai University
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spelling th-cmuir.6653943832-390272015-06-16T08:01:14Z Fabrication of electrostatic MEMS microactuator based on X-ray lithography with Pb-based X-ray mask and dry-film-transfer-to-PCB process Kerdlapee,P. Wisitsoraat,A. Phokaratkul,D. Leksakul,K. Phatthanakun,R. Tuantranont,A. Hardware and Architecture Electrical and Electronic Engineering Electronic, Optical and Magnetic Materials Condensed Matter Physics Lithographie Galvanoformung Abformung (LIGA) is a promising approach for fabrication of high aspect ratio 3D microactuator for dual-stage slider in hard disk drive. However, this approach involves practically challenging X-ray lithography and structural transfer processes. In this work, electrostatic MEMS actuator is developed based on a LIGA approach with cost-effective X-ray lithography and dry-film-transfer-to-PCB process. X-ray lithography is performed with X-ray mask based on lift-off sputtered Pb film on mylar substrate and photoresist application using casting-polishing method. High quality and high aspect ratio SU8 microstructures with inverted microactuator pattern have been achieved with the interdigit spacing of ~5 μm, vertical sidewall and a high aspect ratio of 29 by X-ray lithography using the low-cost Pb based X-ray mask. A new dry-film-transfer-to-PCB is employed by using low-cost dry film photoresist to transfer electroplated nickel from surface-treated chromium-coated glass substrate to printed circuit board (PCB) substrate. The dry film is subsequently released everywhere except anchor contacts of the electrostatic actuator structure. The fabricated actuator exhibits good actuation performance with high displacement at moderate operating voltage and suitably high resonance frequency. Therefore, the proposed fabrication process is a promising alternative to realize low-cost MEMS microactuator for industrial applications. © 2013 Springer-Verlag Berlin Heidelberg. 2015-06-16T08:01:14Z 2015-06-16T08:01:14Z 2014-01-01 Article 09467076 2-s2.0-84892601610 10.1007/s00542-013-1816-x http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=84892601610&origin=inward http://cmuir.cmu.ac.th/handle/6653943832/39027 Springer Verlag
institution Chiang Mai University
building Chiang Mai University Library
country Thailand
collection CMU Intellectual Repository
topic Hardware and Architecture
Electrical and Electronic Engineering
Electronic, Optical and Magnetic Materials
Condensed Matter Physics
spellingShingle Hardware and Architecture
Electrical and Electronic Engineering
Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Kerdlapee,P.
Wisitsoraat,A.
Phokaratkul,D.
Leksakul,K.
Phatthanakun,R.
Tuantranont,A.
Fabrication of electrostatic MEMS microactuator based on X-ray lithography with Pb-based X-ray mask and dry-film-transfer-to-PCB process
description Lithographie Galvanoformung Abformung (LIGA) is a promising approach for fabrication of high aspect ratio 3D microactuator for dual-stage slider in hard disk drive. However, this approach involves practically challenging X-ray lithography and structural transfer processes. In this work, electrostatic MEMS actuator is developed based on a LIGA approach with cost-effective X-ray lithography and dry-film-transfer-to-PCB process. X-ray lithography is performed with X-ray mask based on lift-off sputtered Pb film on mylar substrate and photoresist application using casting-polishing method. High quality and high aspect ratio SU8 microstructures with inverted microactuator pattern have been achieved with the interdigit spacing of ~5 μm, vertical sidewall and a high aspect ratio of 29 by X-ray lithography using the low-cost Pb based X-ray mask. A new dry-film-transfer-to-PCB is employed by using low-cost dry film photoresist to transfer electroplated nickel from surface-treated chromium-coated glass substrate to printed circuit board (PCB) substrate. The dry film is subsequently released everywhere except anchor contacts of the electrostatic actuator structure. The fabricated actuator exhibits good actuation performance with high displacement at moderate operating voltage and suitably high resonance frequency. Therefore, the proposed fabrication process is a promising alternative to realize low-cost MEMS microactuator for industrial applications. © 2013 Springer-Verlag Berlin Heidelberg.
format Article
author Kerdlapee,P.
Wisitsoraat,A.
Phokaratkul,D.
Leksakul,K.
Phatthanakun,R.
Tuantranont,A.
author_facet Kerdlapee,P.
Wisitsoraat,A.
Phokaratkul,D.
Leksakul,K.
Phatthanakun,R.
Tuantranont,A.
author_sort Kerdlapee,P.
title Fabrication of electrostatic MEMS microactuator based on X-ray lithography with Pb-based X-ray mask and dry-film-transfer-to-PCB process
title_short Fabrication of electrostatic MEMS microactuator based on X-ray lithography with Pb-based X-ray mask and dry-film-transfer-to-PCB process
title_full Fabrication of electrostatic MEMS microactuator based on X-ray lithography with Pb-based X-ray mask and dry-film-transfer-to-PCB process
title_fullStr Fabrication of electrostatic MEMS microactuator based on X-ray lithography with Pb-based X-ray mask and dry-film-transfer-to-PCB process
title_full_unstemmed Fabrication of electrostatic MEMS microactuator based on X-ray lithography with Pb-based X-ray mask and dry-film-transfer-to-PCB process
title_sort fabrication of electrostatic mems microactuator based on x-ray lithography with pb-based x-ray mask and dry-film-transfer-to-pcb process
publisher Springer Verlag
publishDate 2015
url http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=84892601610&origin=inward
http://cmuir.cmu.ac.th/handle/6653943832/39027
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