Tailoring of microstructure in hydrogenated nanocrystalline Si thin films by ICP-assisted RF magnetron sputtering
© 2015 IOP Publishing Ltd. Utilizing plasma-assisted deposition by combining an RF magnetron and an inductively coupled plasma (ICP) source it is possible to fabricate highly crystallized nc-Si:H films at a relatively low substrate temperature (300 °C). Microstructural analysis reveals enhancement i...
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| Main Authors: | , , , , |
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| 格式: | 雜誌 |
| 出版: |
2018
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| 在線閱讀: | https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84947093700&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/44125 |
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| 機構: | Chiang Mai University |