Fabrication of 90° wall of {100} plane on (100) Si by NaOH solution via design of experiments
The experimental trials were conducted by design of experiments (DOE) technique to find an anisotropic wet etching condition that achieves 90° wall angle on silicon (100) orientation wafer. Three considered factors assigned to the DOE were NaOH concentration, solution temperature, and stirring speed...
محفوظ في:
| المؤلفون الرئيسيون: | , |
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| التنسيق: | Book Series |
| منشور في: |
2018
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| الوصول للمادة أونلاين: | https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84898902835&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/45495 |
| الوسوم: |
إضافة وسم
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| المؤسسة: | Chiang Mai University |