Patterning of burnishing head using SU-8 hard mask fabricated by deep X-ray lithography
This paper studies on the application of X-ray irradiation from synchrotron light for burnishing head patterning. Feasibility study of SU-8 negative photoresist for AlTiC hard mask in reactive ion etching in CF4 plasma is investigated and compared with chromium and AZ photoresist. X-ray lithography...
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| Main Authors: | , , , |
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| 格式: | Conference Proceeding |
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2018
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| 在線閱讀: | https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84866759299&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/51516 |
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