Effectiveness of hydrogen dilution for designing amorphous to crystalline Si thin film in inductively coupled plasma assisted magnetron sputtering

© 2015 The Japan Society of Applied Physics. Careful analysis and investigations of the formation mechanism of the microstructure of the hydrogenated nanocrystalline silicon (nc-Si:H) film is presented. A systematic approach is made to understand the transition from amorphous (a-Si:H) to crystalline...

Full description

Saved in:
Bibliographic Details
Main Authors: Kyung Sik Shin, Bibhuti Bhusan Sahu, Jeon Geon Han, Masaru Hori
Format: Journal
Published: 2018
Subjects:
Online Access:https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84930447268&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/54495
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Chiang Mai University
id th-cmuir.6653943832-54495
record_format dspace
spelling th-cmuir.6653943832-544952018-09-04T10:25:55Z Effectiveness of hydrogen dilution for designing amorphous to crystalline Si thin film in inductively coupled plasma assisted magnetron sputtering Kyung Sik Shin Bibhuti Bhusan Sahu Jeon Geon Han Masaru Hori Engineering Physics and Astronomy © 2015 The Japan Society of Applied Physics. Careful analysis and investigations of the formation mechanism of the microstructure of the hydrogenated nanocrystalline silicon (nc-Si:H) film is presented. A systematic approach is made to understand the transition from amorphous (a-Si:H) to crystalline (nc-Si:H) by incorporating hydrogen dilution using inductively coupled plasma (ICP) assisted magnetron sputtering. Film analysis and plasma diagnostics results reveal that one can design desired microstructure simply by controlling H2dilution and energy control in the plasmas. 2018-09-04T10:14:49Z 2018-09-04T10:14:49Z 2015-06-01 Journal 13474065 00214922 2-s2.0-84930447268 10.7567/JJAP.54.060303 https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84930447268&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/54495
institution Chiang Mai University
building Chiang Mai University Library
country Thailand
collection CMU Intellectual Repository
topic Engineering
Physics and Astronomy
spellingShingle Engineering
Physics and Astronomy
Kyung Sik Shin
Bibhuti Bhusan Sahu
Jeon Geon Han
Masaru Hori
Effectiveness of hydrogen dilution for designing amorphous to crystalline Si thin film in inductively coupled plasma assisted magnetron sputtering
description © 2015 The Japan Society of Applied Physics. Careful analysis and investigations of the formation mechanism of the microstructure of the hydrogenated nanocrystalline silicon (nc-Si:H) film is presented. A systematic approach is made to understand the transition from amorphous (a-Si:H) to crystalline (nc-Si:H) by incorporating hydrogen dilution using inductively coupled plasma (ICP) assisted magnetron sputtering. Film analysis and plasma diagnostics results reveal that one can design desired microstructure simply by controlling H2dilution and energy control in the plasmas.
format Journal
author Kyung Sik Shin
Bibhuti Bhusan Sahu
Jeon Geon Han
Masaru Hori
author_facet Kyung Sik Shin
Bibhuti Bhusan Sahu
Jeon Geon Han
Masaru Hori
author_sort Kyung Sik Shin
title Effectiveness of hydrogen dilution for designing amorphous to crystalline Si thin film in inductively coupled plasma assisted magnetron sputtering
title_short Effectiveness of hydrogen dilution for designing amorphous to crystalline Si thin film in inductively coupled plasma assisted magnetron sputtering
title_full Effectiveness of hydrogen dilution for designing amorphous to crystalline Si thin film in inductively coupled plasma assisted magnetron sputtering
title_fullStr Effectiveness of hydrogen dilution for designing amorphous to crystalline Si thin film in inductively coupled plasma assisted magnetron sputtering
title_full_unstemmed Effectiveness of hydrogen dilution for designing amorphous to crystalline Si thin film in inductively coupled plasma assisted magnetron sputtering
title_sort effectiveness of hydrogen dilution for designing amorphous to crystalline si thin film in inductively coupled plasma assisted magnetron sputtering
publishDate 2018
url https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84930447268&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/54495
_version_ 1681424331038523392