Effectiveness of hydrogen dilution for designing amorphous to crystalline Si thin film in inductively coupled plasma assisted magnetron sputtering
© 2015 The Japan Society of Applied Physics. Careful analysis and investigations of the formation mechanism of the microstructure of the hydrogenated nanocrystalline silicon (nc-Si:H) film is presented. A systematic approach is made to understand the transition from amorphous (a-Si:H) to crystalline...
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th-cmuir.6653943832-544952018-09-04T10:25:55Z Effectiveness of hydrogen dilution for designing amorphous to crystalline Si thin film in inductively coupled plasma assisted magnetron sputtering Kyung Sik Shin Bibhuti Bhusan Sahu Jeon Geon Han Masaru Hori Engineering Physics and Astronomy © 2015 The Japan Society of Applied Physics. Careful analysis and investigations of the formation mechanism of the microstructure of the hydrogenated nanocrystalline silicon (nc-Si:H) film is presented. A systematic approach is made to understand the transition from amorphous (a-Si:H) to crystalline (nc-Si:H) by incorporating hydrogen dilution using inductively coupled plasma (ICP) assisted magnetron sputtering. Film analysis and plasma diagnostics results reveal that one can design desired microstructure simply by controlling H2dilution and energy control in the plasmas. 2018-09-04T10:14:49Z 2018-09-04T10:14:49Z 2015-06-01 Journal 13474065 00214922 2-s2.0-84930447268 10.7567/JJAP.54.060303 https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84930447268&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/54495 |
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Engineering Physics and Astronomy |
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Engineering Physics and Astronomy Kyung Sik Shin Bibhuti Bhusan Sahu Jeon Geon Han Masaru Hori Effectiveness of hydrogen dilution for designing amorphous to crystalline Si thin film in inductively coupled plasma assisted magnetron sputtering |
| description |
© 2015 The Japan Society of Applied Physics. Careful analysis and investigations of the formation mechanism of the microstructure of the hydrogenated nanocrystalline silicon (nc-Si:H) film is presented. A systematic approach is made to understand the transition from amorphous (a-Si:H) to crystalline (nc-Si:H) by incorporating hydrogen dilution using inductively coupled plasma (ICP) assisted magnetron sputtering. Film analysis and plasma diagnostics results reveal that one can design desired microstructure simply by controlling H2dilution and energy control in the plasmas. |
| format |
Journal |
| author |
Kyung Sik Shin Bibhuti Bhusan Sahu Jeon Geon Han Masaru Hori |
| author_facet |
Kyung Sik Shin Bibhuti Bhusan Sahu Jeon Geon Han Masaru Hori |
| author_sort |
Kyung Sik Shin |
| title |
Effectiveness of hydrogen dilution for designing amorphous to crystalline Si thin film in inductively coupled plasma assisted magnetron sputtering |
| title_short |
Effectiveness of hydrogen dilution for designing amorphous to crystalline Si thin film in inductively coupled plasma assisted magnetron sputtering |
| title_full |
Effectiveness of hydrogen dilution for designing amorphous to crystalline Si thin film in inductively coupled plasma assisted magnetron sputtering |
| title_fullStr |
Effectiveness of hydrogen dilution for designing amorphous to crystalline Si thin film in inductively coupled plasma assisted magnetron sputtering |
| title_full_unstemmed |
Effectiveness of hydrogen dilution for designing amorphous to crystalline Si thin film in inductively coupled plasma assisted magnetron sputtering |
| title_sort |
effectiveness of hydrogen dilution for designing amorphous to crystalline si thin film in inductively coupled plasma assisted magnetron sputtering |
| publishDate |
2018 |
| url |
https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84930447268&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/54495 |
| _version_ |
1681424331038523392 |