Thermal change of amorphous indium tin oxide films sputter-deposited in water vapor atmosphere

Amorphous ITO thin films were deposited on silicon wafers at room temperature by RF + DC magnetron sputtering at water vapor partial pressures between 0 and 6 × 10- 5 Torr. The O/(In + Sn) ratio was determined by Rutherford backscattering spectroscopy. The effect of water vapor on the thermal crysta...

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Bibliographic Details
Main Authors: Wang M.H., Onai Y., Hoshi Y., Lei H., Kondo T., Uchida T., Singkarat S., Kamwanna T., Dangtip S., Aukkaravittayapun S., Nishide T., Tokiwa S., Sawada Y.
Format: Article
Language:English
Published: 2014
Online Access:http://www.scopus.com/inward/record.url?eid=2-s2.0-44349178249&partnerID=40&md5=50c9392c98d8b0755ea6b6ab0e2a25b9
http://cmuir.cmu.ac.th/handle/6653943832/5519
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Institution: Chiang Mai University
Language: English
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