Thermal change of amorphous indium tin oxide films sputter-deposited in water vapor atmosphere
Amorphous ITO thin films were deposited on silicon wafers at room temperature by RF + DC magnetron sputtering at water vapor partial pressures between 0 and 6 × 10- 5 Torr. The O/(In + Sn) ratio was determined by Rutherford backscattering spectroscopy. The effect of water vapor on the thermal crysta...
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Main Authors: | , , , , , , , , , , , , |
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Format: | Article |
Language: | English |
Published: |
2014
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Online Access: | http://www.scopus.com/inward/record.url?eid=2-s2.0-44349178249&partnerID=40&md5=50c9392c98d8b0755ea6b6ab0e2a25b9 http://cmuir.cmu.ac.th/handle/6653943832/5519 |
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Institution: | Chiang Mai University |
Language: | English |
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