Effect of a low gas pressure plasma treatment on copper substrate used for carbon nanotubes synthesis

Effect of a low gas pressure plasma treatment on copper substrate used for carbon nanotubes synthesis

© 2016 Effects of two different mixtures of working gas, namely, 10%Ar + 90%H2and 10%Ar + 90%N2, used in low pressure plasma treatment of copper substrate surface modification in the synthesis of carbon nanotubes by the ACVD method were investigated and compared. After a chemical vapor deposition pr...

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書目詳細資料
Main Authors:	C. Suttichart, D. Boonyawan, W. Nhuapeng, W. Thamjaree
格式:	雜誌
出版:	2018
主題:	Chemistry Materials Science Physics and Astronomy
在線閱讀:	https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84979650471&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/55405
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