High rate direct current magnetron sputtered and texture-etched zinc oxide films for silicon thin film solar cells

High rate direct current magnetron sputtered and texture-etched zinc oxide films for silicon thin film solar cells

Aluminum-doped zinc oxide (AZO) films were prepared by in-line direct current (dc) magnetron sputtering on glass substrates. Four types of ceramic targets with 0.5 wt.% or 1 wt.% of aluminum oxide and different preparation methods, namely normal sintered, soft sintered and hot pressed, were employed...

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Main Authors: T. Tohsophon, J. Hüpkes, H. Siekmann, B. Rech, M. Schultheis, N. Sirikulrat
Format: Journal
Published: 2018
Subjects:
Materials Science
Physics and Astronomy
Online Access:https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=42649137956&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/60514
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Institution: Chiang Mai University
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spelling th-cmuir.6653943832-605142018-09-10T03:48:26Z High rate direct current magnetron sputtered and texture-etched zinc oxide films for silicon thin film solar cells T. Tohsophon J. Hüpkes H. Siekmann B. Rech M. Schultheis N. Sirikulrat Materials Science Physics and Astronomy Aluminum-doped zinc oxide (AZO) films were prepared by in-line direct current (dc) magnetron sputtering on glass substrates. Four types of ceramic targets with 0.5 wt.% or 1 wt.% of aluminum oxide and different preparation methods, namely normal sintered, soft sintered and hot pressed, were employed. The influence of different target manufacturing processes, aluminum concentration and sputtering conditions on AZO films were investigated. Depending on the type of targets and deposition conditions, highly transparent films with low resistivity values in the range of 3.6-11 × 10- 4 Ω cm were obtained. The etching behaviour in hydrochloric acid and the resulting light scattering properties of the AZO films were strongly influenced by the choice of the target and the deposition conditions. The most favourable films have been successfully applied in thin film solar cells with 1.1-μm microcrystalline silicon absorber layer leading to an initial efficiency of 7.8%. © 2007 Elsevier B.V. All rights reserved. 2018-09-10T03:44:10Z 2018-09-10T03:44:10Z 2008-05-30 Journal 00406090 2-s2.0-42649137956 10.1016/j.tsf.2007.06.061 https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=42649137956&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/60514
institution Chiang Mai University
building Chiang Mai University Library
country Thailand
collection CMU Intellectual Repository
topic Materials Science
Physics and Astronomy
spellingShingle Materials Science
Physics and Astronomy
T. Tohsophon
J. Hüpkes
H. Siekmann
B. Rech
M. Schultheis
N. Sirikulrat
High rate direct current magnetron sputtered and texture-etched zinc oxide films for silicon thin film solar cells
description Aluminum-doped zinc oxide (AZO) films were prepared by in-line direct current (dc) magnetron sputtering on glass substrates. Four types of ceramic targets with 0.5 wt.% or 1 wt.% of aluminum oxide and different preparation methods, namely normal sintered, soft sintered and hot pressed, were employed. The influence of different target manufacturing processes, aluminum concentration and sputtering conditions on AZO films were investigated. Depending on the type of targets and deposition conditions, highly transparent films with low resistivity values in the range of 3.6-11 × 10- 4 Ω cm were obtained. The etching behaviour in hydrochloric acid and the resulting light scattering properties of the AZO films were strongly influenced by the choice of the target and the deposition conditions. The most favourable films have been successfully applied in thin film solar cells with 1.1-μm microcrystalline silicon absorber layer leading to an initial efficiency of 7.8%. © 2007 Elsevier B.V. All rights reserved.
format Journal
author T. Tohsophon
J. Hüpkes
H. Siekmann
B. Rech
M. Schultheis
N. Sirikulrat
author_facet T. Tohsophon
J. Hüpkes
H. Siekmann
B. Rech
M. Schultheis
N. Sirikulrat
author_sort T. Tohsophon
title High rate direct current magnetron sputtered and texture-etched zinc oxide films for silicon thin film solar cells
title_short High rate direct current magnetron sputtered and texture-etched zinc oxide films for silicon thin film solar cells
title_full High rate direct current magnetron sputtered and texture-etched zinc oxide films for silicon thin film solar cells
title_fullStr High rate direct current magnetron sputtered and texture-etched zinc oxide films for silicon thin film solar cells
title_full_unstemmed High rate direct current magnetron sputtered and texture-etched zinc oxide films for silicon thin film solar cells
title_sort high rate direct current magnetron sputtered and texture-etched zinc oxide films for silicon thin film solar cells
publishDate 2018
url https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=42649137956&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/60514
_version_ 1681425449764257792

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