Effects of low-fluence swift iodine ion bombardment on the crystallization of ion-beam-synthesized silicon carbide

Ion beam synthesis using high-fluence carbon ion implantation in silicon in combination with subsequent or in situ thermal annealing has been shown to be able to form nanocrystalline cubic SiC (3C-SiC) layers in silicon. In this study, a silicon carbide layer was synthesized by 40-keV C 12 + implant...

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Main Authors: S. Intarasiri, L. D. Yu, S. Singkarat, A. Hallán, J. Lu, M. Ottosson, J. Jensen, G. Possnert
Format: Journal
Published: 2018
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Institution: Chiang Mai University
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spelling th-cmuir.6653943832-613902018-09-10T04:10:37Z Effects of low-fluence swift iodine ion bombardment on the crystallization of ion-beam-synthesized silicon carbide S. Intarasiri L. D. Yu S. Singkarat A. Hallán J. Lu M. Ottosson J. Jensen G. Possnert Physics and Astronomy Ion beam synthesis using high-fluence carbon ion implantation in silicon in combination with subsequent or in situ thermal annealing has been shown to be able to form nanocrystalline cubic SiC (3C-SiC) layers in silicon. In this study, a silicon carbide layer was synthesized by 40-keV C 12 + implantation of a p -type (100) Si wafer at a fluence of 6.5× 1017 ions cm2 at an elevated temperature. The existence of the implanted carbon in Si substrate was investigated by time-of-flight energy elastic recoil detection analysis. The SiC layer was subsequently irradiated by 10-30 MeV I 127 ions to a very low fluence of 1012 ions cm2 at temperatures from 80 to 800 °C to study the effect on the crystallization of the SiC layer. Infrared spectroscopy and Raman scattering measurement were used to monitor the formation of SiC and detailed information about the SiC film properties was obtained by analyzing the peak shape of the Si-C stretching mode absorption. The change in crystallinity of the synthesized layer was probed by glancing incidence x-ray diffraction measurement and transmission electron microscopy was also used to confirm the results and to model the crystallization process. The results from all these measurements showed in a coherent way that the synthesized structure was a polycrystalline layer with nanometer sized SiC crystals buried in a-Si matrix. The crystallinity of the SiC layer was enhanced by the low-fluence swift heavy ion bombardment and also favored by higher energy, higher fluence, and higher substrate temperature. It is suggested that electronic stopping plays a dominant role in the enhancement. © 2007 American Institute of Physics. 2018-09-10T04:10:37Z 2018-09-10T04:10:37Z 2007-05-08 Journal 00218979 2-s2.0-34247585163 10.1063/1.2720090 https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=34247585163&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/61390
institution Chiang Mai University
building Chiang Mai University Library
country Thailand
collection CMU Intellectual Repository
topic Physics and Astronomy
spellingShingle Physics and Astronomy
S. Intarasiri
L. D. Yu
S. Singkarat
A. Hallán
J. Lu
M. Ottosson
J. Jensen
G. Possnert
Effects of low-fluence swift iodine ion bombardment on the crystallization of ion-beam-synthesized silicon carbide
description Ion beam synthesis using high-fluence carbon ion implantation in silicon in combination with subsequent or in situ thermal annealing has been shown to be able to form nanocrystalline cubic SiC (3C-SiC) layers in silicon. In this study, a silicon carbide layer was synthesized by 40-keV C 12 + implantation of a p -type (100) Si wafer at a fluence of 6.5× 1017 ions cm2 at an elevated temperature. The existence of the implanted carbon in Si substrate was investigated by time-of-flight energy elastic recoil detection analysis. The SiC layer was subsequently irradiated by 10-30 MeV I 127 ions to a very low fluence of 1012 ions cm2 at temperatures from 80 to 800 °C to study the effect on the crystallization of the SiC layer. Infrared spectroscopy and Raman scattering measurement were used to monitor the formation of SiC and detailed information about the SiC film properties was obtained by analyzing the peak shape of the Si-C stretching mode absorption. The change in crystallinity of the synthesized layer was probed by glancing incidence x-ray diffraction measurement and transmission electron microscopy was also used to confirm the results and to model the crystallization process. The results from all these measurements showed in a coherent way that the synthesized structure was a polycrystalline layer with nanometer sized SiC crystals buried in a-Si matrix. The crystallinity of the SiC layer was enhanced by the low-fluence swift heavy ion bombardment and also favored by higher energy, higher fluence, and higher substrate temperature. It is suggested that electronic stopping plays a dominant role in the enhancement. © 2007 American Institute of Physics.
format Journal
author S. Intarasiri
L. D. Yu
S. Singkarat
A. Hallán
J. Lu
M. Ottosson
J. Jensen
G. Possnert
author_facet S. Intarasiri
L. D. Yu
S. Singkarat
A. Hallán
J. Lu
M. Ottosson
J. Jensen
G. Possnert
author_sort S. Intarasiri
title Effects of low-fluence swift iodine ion bombardment on the crystallization of ion-beam-synthesized silicon carbide
title_short Effects of low-fluence swift iodine ion bombardment on the crystallization of ion-beam-synthesized silicon carbide
title_full Effects of low-fluence swift iodine ion bombardment on the crystallization of ion-beam-synthesized silicon carbide
title_fullStr Effects of low-fluence swift iodine ion bombardment on the crystallization of ion-beam-synthesized silicon carbide
title_full_unstemmed Effects of low-fluence swift iodine ion bombardment on the crystallization of ion-beam-synthesized silicon carbide
title_sort effects of low-fluence swift iodine ion bombardment on the crystallization of ion-beam-synthesized silicon carbide
publishDate 2018
url https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=34247585163&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/61390
_version_ 1681425611778686976