Effect of helium incorporation on plasma parameters and characteristic properties of hydrogen free carbon films deposited using DC magnetron sputtering
© 2020 Author(s). The present work investigates the effects of helium (He) gas mixing with Ar on plasma parameters and examines its effect on film properties of C films. We used a closed-field unbalanced magnetron sputtering system for the deposition of C thin films at a direct current power density...
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| Main Authors: | , , , |
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| 格式: | 雜誌 |
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2020
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| 主題: | |
| 在線閱讀: | https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85077506949&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/68583 |
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