Responsivity optimization of a MQW SOI-based lateral PIN photodiode using Taguchi's L27 orthogonal array

by Menon, P.S., Tasirin, S.K., Ahmad, I., Abdullah, S.F., Apte, P.R.
Published 2017

Responsivity optimization of a MQW SOI-based lateral PIN photodiode using Taguchi's L27 orthogonal array

by Menon P.S., Tasirin S.K., Ahmad I., Abdullah S.F., Apte P.R.
Published 2023

Optimization of input process parameters variation on threshold voltage in 45 nm NMOS device

by Salehuddin, F., Ahmad, I., Hamid, F.A., Zaharim, A., Hashim, U., Apte, P.R.
Published 2017

Optimization of input process parameters variation on threshold voltage in 45 nm NMOS device

by Salehuddin F., Ahmad I., Hamid F.A., Zaharim A., Hashim U., Apte P.R.
Published 2023

Effect of process parameter variability on the threshold voltage of downscaled 22nm PMOS using taguchi method

by Maheran, A.H.A., Menon, P.S., Shaari, S., Kalaivani, T., Ahmad, I., Faizah, Z.A.N., Apte, P.R.
Published 2017

Effect of process parameter variability on the threshold voltage of downscaled 22nm PMOS using taguchi method

by Maheran A.H.A., Menon P.S., Shaari S., Kalaivani T., Ahmad I., Faizah Z.A.N., Apte P.R.
Published 2023

Statistical process modelling for 32nm high-K/metal gate PMOS device

by Maheran, A.H.A., Noor Faizah, Z.A., Menon, P.S., Ahmad, I., Apte, P.R., Kalaivani, T., Salehuddin, F.
Published 2017

Application of Taguchi method in the optimization of process variation for 32nm CMOS technology

by Elgomati, H.A., Majlis, B.Y., Ahmad, I., Salehuddin, F., Hamid, F.A., Zaharim, A., Apte, P.R.
Published 2017

Optimization of HALO structure effects in 45nm p-type MOSFETs device using taguchi method

by Salehuddin, F., Ahmad, I., Hamid, F.A., Zaharim, A., Elgomati, H.A., Majlis, B.Y., Apte, P.R.
Published 2017

Statistical process modelling for 32nm high-K/metal gate PMOS device

by Maheran A.H.A., Noor Faizah Z.A., Menon P.S., Ahmad I., Apte P.R., Kalaivani T., Salehuddin F.
Published 2023

Optimization of HALO structure effects in 45nm p-type MOSFETs device using taguchi method

by Salehuddin F., Ahmad I., Hamid F.A., Zaharim A., Elgomati H.A., Majlis B.Y., Apte P.R.
Published 2023

Application of Taguchi method in the optimization of process variation for 32nm CMOS technology

by Elgomati H.A., Majlis B.Y., Ahmad I., Salehuddin F., Hamid F.A., Zaharim A., Apte P.R.
Published 2023

Statistical optimization for process parameters to reduce variability of 32 nm PMOS transistor threshold voltage

by Elgomati, H.A., Majlis, B.Y., Ahmad, I., Salehuddin, F., Hamid, F.A., Zaharim, A., Mohamad, T.Z., Apte, P.R.
Published 2017

Statistical optimization for process parameters to reduce variability of 32 nm PMOS transistor threshold voltage

by Elgomati H.A., Majlis B.Y., Ahmad I., Salehuddin F., Hamid F.A., Zaharim A., Mohamad T.Z., Apte P.R.
Published 2023

Optimization of process parameter variation in 45nm p-channel MOSFET using L18 orthogonal array

by Salehuddin, F., Ahmad, I., Hamid, F.A., Zaharim, A., Hamid, A.M.A., Menon, P.S., Elgomati, H.A., Majlis, B.Y., Apte, P.R.
Published 2017

Optimization of process parameter variation in 45nm p-channel MOSFET using L18 orthogonal array

by Salehuddin F., Ahmad I., Hamid F.A., Zaharim A., Hamid A.M.A., Menon P.S., Elgomati H.A., Majlis B.Y., Apte P.R.
Published 2023