Modeling and optimizing of threshold voltage of 32nm NMOS transistor using L18 orthogonal array Taguchi method

by Elgomati, H.A., Majlis, B.Y., Ahmad, I.
Published 2017

Modeling and optimizing of threshold voltage of 32nm NMOS transistor using L18 orthogonal array Taguchi method

by Elgomati H.A., Majlis B.Y., Ahmad I.
Published 2023

Characterization of fabrication process noises for 32nm NMOS devices

by Elgomati, H.A., Majlis, B.Y., Ahmad, I., Ziad, T.
Published 2017

Characterization of fabrication process noises for 32nm NMOS devices

by Elgomati H.A., Majlis B.Y., Ahmad I., Ziad T.
Published 2023

Design and optimization of 22 nm gate length high-k/metal gate NMOS transistor

by Afifah Maheran, A.H., Menon, P.S., Ahmad, I., Shaari, S., Elgomati, H.A., Salehuddin, F.
Published 2017

Design and optimization of 22 nm gate length high-k/metal gate NMOS transistor

by Afifah Maheran A.H., Menon P.S., Ahmad I., Shaari S., Elgomati H.A., Salehuddin F.
Published 2023

Modelling of process parameters for 32nm PMOS transistor using Taguchi method

by Elgomati, H.A., Majlis, B.Y., Hamid, A.M.A., Susthitha, P.M., Ahmad, I.
Published 2017

Cobalt silicide and titanium silicide effects on nano devices

by Elgomati, H.A., Majlis, B.Y., Salehuddin, F., Ahmad, I., Zaharim, A., Hamid, F.A.
Published 2017

Analyze of input process parameter variation on threshold voltage in 45nm n-channel MOSFET

by Salehuddin, F., Ahmad, I., Hamid, F.A., Zaharim, A., Elgomati, H.A., Majlis, B.Y.
Published 2017

Optimizing 35nm NMOS devices V TH and I LEAK by controlling active area and halo implantation dosage

by Elgomati, H.A., Majlis, B.Y., Salehuddin, F., Ahmad, I., Zaharim, A., Hamid, F.A.
Published 2017

Optimizing 35nm NMOS devices V TH and I LEAK by controlling active area and halo implantation dosage

by Elgomati H.A., Majlis B.Y., Salehuddin F., Ahmad I., Zaharim A., Hamid F.A.
Published 2023

Modelling of process parameters for 32nm PMOS transistor using Taguchi method

by Elgomati H.A., Majlis B.Y., Hamid A.M.A., Susthitha P.M., Ahmad I.
Published 2023

Cobalt silicide and titanium silicide effects on nano devices

by Elgomati H.A., Majlis B.Y., Salehuddin F., Ahmad I., Zaharim A., Hamid F.A.
Published 2023

Analyze of input process parameter variation on threshold voltage in 45nm n-channel MOSFET

by Salehuddin F., Ahmad I., Hamid F.A., Zaharim A., Elgomati H.A., Majlis B.Y.
Published 2023

Scaling down of the 32 nm to 22 nm gate length NMOS transistor

by Afifah Maheran, A.H., Menon, P.S., Ahmad, I., Elgomati, H.A., Majlis, B.Y., Salehuddin, F.
Published 2017

Scaling down of the 32 nm to 22 nm gate length NMOS transistor

by Afifah Maheran A.H., Menon P.S., Ahmad I., Elgomati H.A., Majlis B.Y., Salehuddin F.
Published 2023

Design and optimization of 22nm NMOS transistor

by Afifah Maheran, A.H., Menon, P.S., Ahmad, I., Shaari, S., Elgomati, H.A., Majlis, B.Y., Salehuddin, F.
Published 2017

Design and optimization of 22nm NMOS transistor

by Afifah Maheran A.H., Menon P.S., Ahmad I., Shaari S., Elgomati H.A., Majlis B.Y., Salehuddin F.
Published 2023

Application of Taguchi method in the optimization of process variation for 32nm CMOS technology

by Elgomati, H.A., Majlis, B.Y., Ahmad, I., Salehuddin, F., Hamid, F.A., Zaharim, A., Apte, P.R.
Published 2017

Optimization of HALO structure effects in 45nm p-type MOSFETs device using taguchi method

by Salehuddin, F., Ahmad, I., Hamid, F.A., Zaharim, A., Elgomati, H.A., Majlis, B.Y., Apte, P.R.
Published 2017