Evaluation of back-side secondary ion mass spectrometry for boron diffusion in silicon and silicon-on-insulator substrates

by Yeo, K.L., Wee, A.T.S., Chong, Y.F.
Published 2014

In situ XPS and SIMS analysis of O 2 + beam-induced silicon oxidation

by Tan, S.K., Yeo, K.L., Wee, A.T.S.
Published 2014

Drying of guava and papaya: Impact of different drying methods

by Hawlader, M.N.A., Perera, C.O., Tian, M., Yeo, K.L.
Published 2014

SIMS backside depth profiling of ultrashallow implants using silicon-on-insulator substrates

by Yeo, K.L., Wee, A.T.S., Liu, R., Ng, C.M., See, A.
Published 2014

SIMS backside depth profiling of ultra shallow implants

by Yeo, K.L., Wee, A.T.S., See, A., Liu, R., Ng, C.M.
Published 2014

Investigation of boron penetration through decoupled plasma nitrided gate oxide using backside secondary ion mass spectrometry depth profiling

by Yeo, K.L., Wee, A.T.S., Liu, R., Zhou, F.F., See, A.
Published 2014

Adaptation of finger-smoothed irreversible hydrocolloid to impression surfaces.

by Lim, P.F., Neo, K.H., Sitoh, L., Yeo, K.L., Stokes, A.
Published 2014

Thermal confinement of advanced semiconductor substrates during laser annealing

by Pey, K.L., Ong, K.K., Lee, P.S., Wee, A.T.S., Wang, X.C., Chong, Y.F., Yeo, K.L.
Published 2014

Formation of ultra-shallow p +/n junctions in silicon-on-insulator (SOI) substrate using laser annealing

by Ong, K.K., Pey, K.L., Lee, P.S., Wee, A.T.S., Chong, Y.F., Yeo, K.L., Wang, X.C.
Published 2014

Formation of ultra-shallow p+/n junctions in silicon-on-insulator (SOI) substrate using laser annealing

by Wang, X. C., Pey, Kin Leong, Lee, Pooi See, Ong, K. K., Wee, A. T. S., Chong, Y. F., Yeo, K. L.
Published 2013