Interface reconstruction of MSi2 Si(001) (M=Co,Ni) from first principles

by Zhao, F.F., Feng, Y.P., Dong, Y.F., Zheng, J.Z.
Published 2014

Evolution of surface roughness during metal silicides phase transformation

by Pang, C. H., Hing, P., Zhao, F. F., See, A., Chong, Y. F., Lee, Pooi See
Published 2012

Thermal stability study of NiSi and NiSi2 thin films

by Zhao, F.F., Zheng, J.Z., Shen, Z.X., Osipowicz, T., Gao, W.Z., Chan, L.H.
Published 2014

Applications of micro-Raman spectroscopy in salicide characterization for Si device fabrication

by Zhao, F.F., Chen, S.Y., Shen, Z.X., Gao, X.S., Zheng, J.Z., See, A.K., Chan, L.H.
Published 2014

Thickness effect on nickel silicide formation and thermal stability for ultra shallow junction CMOS

by Zhao, F.F., Shen, Z.X., Zheng, J.Z., Gao, W.Z., Osipowicz, T., Pang, C.H., Lee, P.S., See, A.K.
Published 2014

Approach to interface roughness of silicide thin films by micro-Raman imaging

by Zhao, F.F., Sun, W.X., Feng, Y.P., Zheng, J.Z., Shen, Z.X., Pang, C.H., Chan, L.H.
Published 2014