DESIGN AND IMPLEMENTATION OF INSTRUMENTATION SYSTEMS ON ROTATING ANALYZER ELLIPSOMETER
In the semiconductor industry, the thickness of the photoresist layer when the photolithograph process plays an important role in determining a failure in IC manufacturing. The thickness of this layer is important because, at the stage of addition of doping ions, a photoresist that is too thin will...
Saved in:
Main Author: | Yusron Muttaqin, Muchammad |
---|---|
Format: | Final Project |
Language: | Indonesia |
Online Access: | https://digilib.itb.ac.id/gdl/view/37032 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | Institut Teknologi Bandung |
Language: | Indonesia |
Similar Items
-
DESIGN AND IMPLEMENTATION OF OPTICAL COMPONENTS AND 3D STRUCTURE OF THIN FILM THICKNESS MEASUREMENT SYSTEM USING ROTATING ANALYZER ELLIPSOMETRY METHOD
by: Al-Hawari, Muhammad -
DESIGN AND IMPLEMENTATION OF DIGITAL SIGNAL PROCESSING SYSTEM USING ESP32 FOR THIN FILM THICKNESS MEASUREMENT SYSTEM USING ROTATING ANALYZER ELLIPSOMETRY METHOD
by: Derlian Salu, Megah -
DESIGN AND IMPLEMENTATION OF INSTRUMENTATION SYSTEMS ON CAR BATTERY DIAGNOSERS
by: Salman Galileo, Muhammad -
DESIGN AND IMPLEMENTATION INSTRUMENTATION SYSTEM OF MOTOPROTECT: MOTORCYCLE SECURITY SYSTEM
by: Amadeus Abel Puspodewo, Yoseph -
FORMALLY ANALYZING AND VERIFYING SECURE SYSTEM DESIGN AND IMPLEMENTATION
by: BAI GUANGDONG
Published: (2015)